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Cl on Si(100)2
1 by means of SR-XPSTsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka; Yaita, Tsuyoshi
no journal, ,
To achieve Cs decontamination in clay minerals by using CHCl gas, we have investigated the adsorption reactions and adsorption states of CHCl at Si surfaces. In this conference, we report that dissociative adsorption of CHCl to form CH and Cl was revealed from the high energy-resolutions photoemission spectra.
Tsukada, Chie*; Yoshida, Hikaru; Ogawa, Satoshi*; Yoshigoe, Akitaka; Yagi, Shinya*; Yaita, Tsuyoshi
no journal, ,
To recovery from the Fukushima Daiichi Nuclear Power Station accident, the removal of radioactive Cs from the soil and cooling water is important. An absorbent and a removal procedure of Cs are required to have properties of effective separation ability, recyclable and energy saving. Here, we focus on the gold nanoparticles (AuNPs) fabricated by solution plasma method. The purpose of this study is to reveal the surface chemical states of the AuNPs fabricated by solution plasma method in CsCl aqueous solution. From the synchrotron light based analysis, it was found that the Cs-Cl-Au bondings form by the repeat of below two steps. (1) Cs and Cl atoms adsorb on AuNPs surface (Cs-Au and Cl-Au bondings). (2) Au atoms bonds around the AuNPs surface.